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Download Cluster Secondary Ion Mass Spectrometry: Principles and by Dominic M. Desiderio, Nico M. M. Nibbering, Joseph A. PDF

By Dominic M. Desiderio, Nico M. M. Nibbering, Joseph A. Loo(eds.)

Explores the effect of the most recent breakthroughs in cluster SIMS technology

Cluster secondary ion mass spectrometry (SIMS) is a excessive spatial solution imaging mass spectrometry process, which might be used to symbolize the three-d chemical constitution in complicated natural and molecular structures. it really works by utilizing a cluster ion resource to sputter desorb fabric from an excellent pattern floor. ahead of the appearance of the cluster resource, SIMS was once significantly restricted in its skill to signify smooth samples because of harm from the atomic resource. Molecular samples have been primarily destroyed in the course of research, proscribing the method's sensitivity and precluding compositional intensity profiling. using new and rising cluster ion beam applied sciences has all yet eradicated those barriers, allowing researchers to go into into new fields as soon as thought of unimaginable through the SIMS technique.

With contributions from best mass spectrometry researchers all over the world, Cluster Secondary Ion Mass Spectrometry: ideas and Applications describes the newest breakthroughs in instrumentation, and addresses top practices in cluster SIMS research. It serves as a compendium of data on natural and polymeric floor and in-depth characterization utilizing cluster ion beams. It covers subject matters starting from the basics and idea of cluster SIMS, to the $64000 chemistries at the back of the luck of the strategy, in addition to the wide-ranging purposes of the know-how. Examples of matters lined comprise:

  • Cluster SIMS thought and modeling
  • Cluster ion resource forms and function expectations
  • Cluster ion beams for floor research experiments
  • Molecular intensity profiling and 3-D research with cluster ion beams
  • Specialty functions starting from organic samples research to semiconductors/metals analysis
  • Future demanding situations and clients for cluster SIMS

This e-book is meant to learn any scientist, starting from starting to complicated in point, with lots of figures to assist higher comprehend complicated ideas and techniques. furthermore, each one bankruptcy ends with an in depth reference set to the first literature, facilitating additional examine into person themes the place wanted. Cluster Secondary Ion Mass Spectrometry: ideas and Applications is a must have learn for any researcher within the floor research and/or imaging mass spectrometry fields.Content:
Chapter 1 An advent to Cluster Secondary Ion Mass Spectrometry (Cluster SIMS) (pages 1–11): Christine M. Mahoney and Greg Gillen
Chapter 2 Cluster SIMS of natural fabrics: Theoretical Insights (pages 13–55): Arnaud Delcorte, Oscar A. Restrepo and Bartlomiej Czerwinski
Chapter three Ion resources Used for Secondary Ion Mass Spectrometry (pages 57–75): Albert J. Fahey
Chapter four floor research of natural fabrics with Polyatomic basic Ion resources (pages 77–116): Christine M. Mahoney
Chapter five Molecular intensity Profiling with Cluster Ion Beams (pages 117–205): Christine M. Mahoney and Andreas Wucher
Chapter 6 Three?Dimensional Imaging with Cluster Ion Beams (pages 207–246): Andreas Wucher, Gregory L. Fisher and Christine M. Mahoney
Chapter 7 Cluster Secondary Ion Mass Spectrometry (SIMS) For Semiconductor and Metals intensity Profiling (pages 247–268): Greg Gillen and Joe Bennett
Chapter eight Cluster TOF?SIMS Imaging and the Characterization of organic fabrics (pages 269–312): John Vickerman and Nick Winograd
Chapter nine destiny demanding situations and clients of Cluster SIMS (pages 313–327): Peter Williams and Christine M. Mahoney

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Extra info for Cluster Secondary Ion Mass Spectrometry: Principles and Applications

Sample text

Depending on the projectile energy, the sputtering yield increases with the number of molecular layers in the self-assembly, up to two layers at 10–15 keV and three layers at 30 keV. For thicker assemblies, the yield gradually decreases toward a plateau value, indicating that the substrate does not influence the molecular emission anymore. It is interesting to note that the total sputtered mass at the plateau value (∼60 kDa at 15 keV) is also quite comparable to the value obtained for a bulk amorphous polymeric sample (Fig.

25 19 (2 dimers) Line 2 (crater + rim Ø) indicates the diameter of the crater including its rim. Line 5 (sputtered + rim) corresponds to the cumulated mass of the sputtered material and the material contained in the crater rim, above the surface. In all cases, the values have been obtained for a single trajectory. Reprinted from Delcorte and Garrison,34 with permission from ACS publications. 34 The values calculated from MD simulations of hydrocarbon molecular samples are signified by full red (C99 H200 ) and open circles (C20 H42 , C249 H500 , and C1000 H2002 ).

8b), the energized nanovolume is entirely included in the top molecular layer and the polymeric chains in that volume undergo extensive bond breaking and other stresses. Hence, very few or no intact molecules are sputtered, only fragments. In this case, atomic projectiles may even be more efficient than clusters for sputtering, as suggested by the results obtained with single Au, because they penetrate and break bonds deeper in the sample thereby liberating larger fragments than Au3 and C60 projectiles.

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